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Migration volume

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  • The effects of strain on the diffusion of impurities in silicon crystal are investigated using the statistical moment method (SMM). The influence of tensile strain on diffusion coefficient D is characterized by relaxation volume V r and migration volume V m. The numerical results for B and P diffusion in silicon that are performed and compared to experimental data show good agreement.

    pdf8p tamynhan8 04-11-2020 10 0   Download

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