Substrate bias

This work reports the deposition of a dense α-Ta and β-Ta films to enhance the surface hardness and biocompatibility of Ti by applying a different negative substrate bias during direct current (DC) sputtering. When a Ta film was deposited with a negative substrate bias voltage of 70 V, the microstructure of the film exhibited a single β-Ta phase.

8p vimitsuki 30-03-2025 2 1   Download